13. Scalable high-mobility MoS2 thin films fabricated by an atmospheric pressure chemical vapor deposition process at ambient temperature

C. C. Huang, F. Al-Saab, Y. Wang, J. Y. Ou, J. C. Walker, S. Wang, B. Gholipour, R. E. Simpson, D. W. Hewak

13. Scalable high-mobility MoS2 thin films fabricated by an atmospheric pressure chemical vapor deposition process at ambient temperature